STUDY THE INTERDIFFUSION IN AMORPHOUS Nb/Si MULTILAYER | Zendy

Ming Zhang | Zendy; YU WEN | Zendy; Jun Zhang | Zendy; ZHANG YUAN-YI | Zendy; WNAG WEN-KUI | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

STUDY THE INTERDIFFUSION IN AMORPHOUS Nb/Si MULTILAYER

Author(s) -

Ming Zhang,

YU WEN,

Jun Zhang,

ZHANG YUAN-YI,

WNAG WEN-KUI

Publication year - 1996

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.45.1724

Subject(s) - materials science , amorphous solid , diffusion , amorphous metal , condensed matter physics , analytical chemistry (journal) , composite material , thermodynamics , crystallography , physics , chemistry , chromatography , alloy

The amorphous Nb/Si multilayers were prepared for the interdiffusion study. The temperature dependent effective interdiffusion at low temperature in amorphous Nb/Si multilayer was obtained using in-situ XRD technique. The smaller pre-exponential factor for diffusion coefficient in amorphous Nb/Si multilayer is explained by the trap-retarded diffusion mechanism. In this model, the atomic vibration frequency v is substituted by the average characteristic atomic vibration frequency v because of the presence of defect traps.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research