Open AccessSTUDY THE INTERDIFFUSION IN AMORPHOUS Nb/Si MULTILAYER
Author(s) -
Ming Zhang,
Yuanqiao Wen,
Jun Zhang,
Yuanyi Zhang,
Wnag Wen-Kui
Publication year - 1996
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.45.1724
Subject(s) - materials science , amorphous solid , diffusion , amorphous metal , condensed matter physics , analytical chemistry (journal) , composite material , thermodynamics , crystallography , physics , chemistry , chromatography , alloy
The amorphous Nb/Si multilayers were prepared for the interdiffusion study. The temperature dependent effective interdiffusion at low temperature in amorphous Nb/Si multilayer was obtained using in-situ XRD technique. The smaller pre-exponential factor for diffusion coefficient in amorphous Nb/Si multilayer is explained by the trap-retarded diffusion mechanism. In this model, the atomic vibration frequency v is substituted by the average characteristic atomic vibration frequency v because of the presence of defect traps.