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APPROCHING TO SATURATION OF Ni/NiO INTERFACE
Author(s) -
Wang Wen-nai,
JIANG ZHENG-SHENG,
SANG HAI,
Cheng Guang-Xu,
GE XIANG,
Du You-Wei
Publication year - 1996
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.45.140
Subject(s) - non blocking i/o , materials science , magnetization , condensed matter physics , saturation (graph theory) , nickel , magnetic field , thin film , analytical chemistry (journal) , nanotechnology , metallurgy , chemistry , physics , biochemistry , mathematics , chromatography , quantum mechanics , combinatorics , catalysis
The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiO multi-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperatures below 80 K, an abnormal enhanced magnetization under external magnetic field (H = 40kOe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 kOe) magnetization (approching to saturation) of ultrafine particles and multi-thin layers were also measured. The fit results for experimental data indicate that the interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.

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