Open AccessSTRUCTURE AND SURFACE ELECTRICAL PROPERTIES OF POLYCRYSTALLINE ZrO2 IMPLANTED BY Ni ION
Author(s) -
Wang Guo-Mei,
Yun Hu,
Bing Jiang,
LI XING-DAN,
WU DAI-HUA,
Yang Sheng-rong
Publication year - 1996
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.45.1160
Subject(s) - x ray photoelectron spectroscopy , crystallite , materials science , annealing (glass) , raman spectroscopy , ion , ion implantation , surface layer , analytical chemistry (journal) , nickel , spectroscopy , raman scattering , low energy ion scattering , layer (electronics) , nuclear magnetic resonance , nanotechnology , optics , metallurgy , chemistry , physics , organic chemistry , chromatography , quantum mechanics
In this paper, it is reported that the nickel ions (140 keV, 5×1015-2×1017ions/cm2) were implanted at room temperature into the specimens of yttria which were partially stabilized by zirconi-a. The annealing processes were decided . By making use of electric measurement, Rutherford back scattering spectroscopy (RBS), X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy, we have studied the effects of implantation and annealing on the electrical properties of the surface and the structure of implanted layer of polycrystalline ZrO2.