Open AccessSTRUCTURAL CHARACTERIZATION OF THE CN FILMS
Author(s) -
Feng Jin,
Chunping Long,
Zhang Fang-Wei,
Zhengming Yi,
Fan Ye
Publication year - 1996
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.45.1068
Subject(s) - materials science , reflection high energy electron diffraction , x ray photoelectron spectroscopy , electron diffraction , amorphous solid , crystallography , spectral line , knoop hardness test , single crystal , diffraction , reflection (computer programming) , infrared spectroscopy , analytical chemistry (journal) , optics , nuclear magnetic resonance , chemistry , physics , indentation hardness , microstructure , programming language , organic chemistry , chromatography , astronomy , computer science , metallurgy
Growth of CN films on Si (111) is realized by ionized cluster beam (ICB) deposition. X-ray diffraction (XRD) shows the occurence of β-C3N4 crystal structure in the films. X-ray photoelectron spectra (XPS) shows 20% N incorporated into the films and two peaks are observed in C1s and N1s, core level spectra respectively. Single bonded CN and triple bonded CN were identifies by infrared absorption spectra. Reflection high-energy electron diffraction (RHEED) demonstracted the coexistence of amorphous and crystalline CN compounds. The Knoop hardness of CN films reaches 6200 kgf/mm2.