Open AccessMoSi_x多层薄膜电阻率温度系数及电子的弱局域性研究
Author(s) -
Xiaopeng Wang,
Tiansheng Zhao,
Hang Ji,
Qi Liang,
Jian Ye,
Cihui Liu,
Shunxi Wang
Publication year - 1995
Publication title -
wuli xuebao
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.44.305
Subject(s) - materials science , intermetallic , physics , composite material , alloy