Open AccessMoSi_x多层薄膜电阻率温度系数及电子的弱局域性研究
Author(s) -
Wang Xiaopeng,
Te-Xiu Zhao,
Ji Hang,
Liang Qi,
Ye Jian,
Cihui Liu,
Shunxi Wang
Publication year - 1995
Publication title -
acta physica sinica
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.44.305
Subject(s) - materials science , intermetallic , physics , composite material , alloy
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