Open AccessTEMPERATURE DEPENDENCE OF ELECTRIC RESISTIVITY OF Nd-Fe AMORPHOUS THIN FILMS AND ITS THERMAL STABILITY
Author(s) -
Lyu Man-qi,
A. Wagendristel
Publication year - 1993
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.42.840
Subject(s) - materials science , amorphous solid , crystallization , electrical resistivity and conductivity , thermal stability , thin film , atmospheric temperature range , evaporation , flash evaporation , condensed matter physics , chemical engineering , thermodynamics , crystallography , nanotechnology , electrical engineering , physics , chemistry , engineering
The NdxFe1-x amorphous thin films with x=0.06-0.80 were prepared at 77 K by flash evaporation. The results show that the amorphous films are stable at room temperature when 0.192 and T untill the crystallization occurs. The crystallization of the amorphous films can not be completed at a certain fixed temperature but over a temperature range.