Open AccessSPATIAL DISTRIBUTIONS OF X-RAY LASING LINEWIDTH AND ELECTRON DENSITY IN A Li-LIKE SILICON PLASMA
Author(s) -
Peixiang Lu,
Zhengquan Zhang,
Zhizhan Xu,
Ping Fan,
Biluo Shen,
Shisheng Chen
Publication year - 1993
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.42.273
Subject(s) - laser linewidth , lasing threshold , electron density , stark effect , atomic physics , ion , plasma , laser , electron , materials science , silicon , line (geometry) , x ray , physics , optics , spectral line , optoelectronics , geometry , mathematics , quantum mechanics , astronomy
Through analysizing the spatial distribution characteristics of the linewidth of Li-like si-licon ions X-ray lasers, we show that Stark broadening is the main line broadening me-chanism for Li-like Si11+ ions recombine X-ray laser. Spatial distribution of the electron den-sity of gain medium obtained by Stark brcadening shows that the electron density in the gain region is about 1019/cm3, and the lasing linewidth and electron density are 0.21? and 2.9 × l019/cm3 at the gain maximum respectively.