STUDY THE DIFFUSION MECHANISM OF Ni IN AMORPHOUS Si BY X-RAY DIFFRACTION | Zendy

Weihua Wang | Zendy; Bai Hai-Yang | Zendy; Yun Zhang | Zendy; Chen Hong | Zendy; Wenkui Wang | Zendy

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STUDY THE DIFFUSION MECHANISM OF Ni IN AMORPHOUS Si BY X-RAY DIFFRACTION

Author(s) -

Weihua Wang,

Bai Hai-Yang,

Yun Zhang,

Chen Hong,

Wenkui Wang

Publication year - 1993

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.42.1505

Subject(s) - amorphous solid , materials science , diffraction , diffusion , thermal diffusivity , x ray , amorphous metal , crystallography , chemical physics , thermodynamics , optics , chemistry , physics

he diffusion mechanism of the Ni in amorphous Si was studied by in situ X-ray diffraction technique in amorphous Ni/Si multilayer. The temperature dependent diffusivity of Ni in amorphous Si was obtained in the form of Arrheneius relationship. A trap-retarded interstitial diffusion mechanism is suggested to explain the diffusion process of Ni in amorphous Si.

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