Open AccessSTUDY THE DIFFUSION MECHANISM OF Ni IN AMORPHOUS Si BY X-RAY DIFFRACTION
Author(s) -
Weihua Wang,
Bai Hai-Yang,
Yun Zhang,
Chen Hong,
Wenkui Wang
Publication year - 1993
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.42.1505
Subject(s) - amorphous solid , materials science , diffraction , diffusion , thermal diffusivity , x ray , amorphous metal , crystallography , chemical physics , thermodynamics , optics , chemistry , physics
he diffusion mechanism of the Ni in amorphous Si was studied by in situ X-ray diffraction technique in amorphous Ni/Si multilayer. The temperature dependent diffusivity of Ni in amorphous Si was obtained in the form of Arrheneius relationship. A trap-retarded interstitial diffusion mechanism is suggested to explain the diffusion process of Ni in amorphous Si.