ARUPS OF THE ADSORPTION OF NITRIC OXIDE ON Cu(llO) SURFACE AT 150K | Zendy

ZHANG XUN-SHENG | Zendy; DONG FENG | Zendy; Bao De-Song | Zendy; Zhiqiang Du | Zendy

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ARUPS OF THE ADSORPTION OF NITRIC OXIDE ON Cu(llO) SURFACE AT 150K

Author(s) -

ZHANG XUN-SHENG,

DONG FENG,

Bao De-Song,

Zhiqiang Du

Publication year - 1993

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.42.1194

Subject(s) - angle resolved photoemission spectroscopy , adsorption , molecule , materials science , physisorption , oxygen , nitric oxide , oxide , electronic structure , chemistry , computational chemistry , metallurgy , organic chemistry

The investigation of ARUPS of nitric oxide adsorbed on Cu(110) is reported here. The results show that it is a complex dissociative process that occurs at 150 K. Varied with the exposure of NO, the different molecules which are dissociated from NO, are adsorbed on Cu (110). With 5L NO the dominant adsorbates are atomic oxygen and N2O molecules. The adsorption LEED pattern is still (1×1). The present problem has been studied by ARUPS, LEED and AES.

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