Open AccessARUPS OF THE ADSORPTION OF NITRIC OXIDE ON Cu(llO) SURFACE AT 150K
Author(s) -
Zhang Xun-Sheng,
Dong Feng,
Dinghua Bao,
Zhiqiang Du
Publication year - 1993
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.42.1194
Subject(s) - angle resolved photoemission spectroscopy , adsorption , molecule , materials science , physisorption , oxygen , nitric oxide , oxide , electronic structure , chemistry , computational chemistry , metallurgy , organic chemistry
The investigation of ARUPS of nitric oxide adsorbed on Cu(110) is reported here. The results show that it is a complex dissociative process that occurs at 150 K. Varied with the exposure of NO, the different molecules which are dissociated from NO, are adsorbed on Cu (110). With 5L NO the dominant adsorbates are atomic oxygen and N2O molecules. The adsorption LEED pattern is still (1×1). The present problem has been studied by ARUPS, LEED and AES.