Open AccessFORMATION OF HOLOGRAPHIC DIFFRACTION GRATINGS ON THE SURFACE OF A n-TYPE Ga As AND MEASURING OF LIGHT EMISSION BY SURFACE PLASMON POLARITON
Author(s) -
WU DlNG-XIANG
Publication year - 1992
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.41.282
Subject(s) - materials science , holography , polariton , diffraction , optoelectronics , surface plasmon polariton , optics , diffraction grating , surface plasmon , schottky barrier , etching (microfabrication) , schottky diode , diffraction efficiency , plasmon , diode , grating , layer (electronics) , nanotechnology , physics
The method to produce diffraction gratings by H2O2-H2SO4 photo-accelerated etching on the surface of n-GaAs and measuring of light emission by surface pla smon polariton from an Ag/n-GaAs Schottky barrier diode are discussed in this paper.