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BEHAVIOUR OF X-RAY DIFFRACTION FROM UNIFORMLY BENT Si CRYSTAL
Author(s) -
Pin Yang
Publication year - 1992
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.41.267
Subject(s) - bent molecular geometry , diffraction , crystal (programming language) , materials science , intensity (physics) , optics , dynamical theory of diffraction , diffraction topography , x ray crystallography , condensed matter physics , physics , crystallography , acousto optics , composite material , chemistry , computer science , programming language , diffraction grating
X-ray diffraction from uniformly bent Si crystal has been studied. The experimental integrated diffraction intensity rises monotonically with the strain in the crystal, this coincides with the theory. The visibility of Pendell?sung fringes becomes poorer as the strain goes up, this reflects the increse of intensity difference between the wave fields and variation of the trace of the wave fields in the crystal.

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