Open AccessGAUSSIAN-TO-UNIFORM BEAM CONVERSION WITH PHASE-ONLY MASKS MADE BY REACTIVE ION-ETCHING
Author(s) -
Jingjuan Zhang,
Guoguang Yang,
Xu Chao,
Deliang Lian,
Chen Jun-Ben,
Huo Yu Ping,
Gao Shiping,
Baoqin Chen
Publication year - 1992
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.41.1961
Subject(s) - reactive ion etching , materials science , optics , gaussian , transformation (genetics) , phase (matter) , beam (structure) , etching (microfabrication) , gaussian beam , ion beam , ion , optoelectronics , physics , nanotechnology , chemistry , quantum mechanics , biochemistry , layer (electronics) , gene
The general optical transformation theory is used for the design for converting Gaussian laser beam into a uniform profile. The transformation system can be achieved with two phase-only masks system. The phase-only mask may be fabricated with reactive ion-etching on a quartz plate. Experimenra) results indicate that the output beam profile is consistent with the theoretical calculation. The conversion efficiency is higher than 95%.