Open AccessA STUDY ON REACTION KINETICS OF THE RADICALS PRODUCED IN THE LASER-INDUCED SILANE PLASMA
Author(s) -
Fu Guang-Sheng,
Jinguo Wang,
Xiaowei Li,
Han Li,
Lyu Fu-Run
Publication year - 1991
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.40.2024
Subject(s) - plasma , kinetic energy , laser , kinetics , silane , materials science , radical , chemical kinetics , plasma channel , analytical chemistry (journal) , atomic physics , optics , chemistry , physics , nuclear physics , composite material , environmental chemistry , organic chemistry , quantum mechanics
The reaction kinetic processes of species produced in a pulsed TEA CO2 laser induced si-lane plasma were studied with the time-resolved OES. It is showed that the time position of main peaks for different fragments' charactristic lines are appreciably different. The reaction kinetic processes are discussed based on the results. By comparing the time evolution of the lines of the fragments and considering the other results of OES, We infer that the final reaction channel of the laser-induced silane plasma is a Si producing channel.