Open AccessPREPARATION OF DIAMOND FILMS BY DC ARC DISCHARGE AND IN SITU MEASUREMENTS OF THE PLASMA BY OPTICAL EMISSION SPECTRA
Author(s) -
Fangqing Zhang,
Yafei Zhang,
Yinghu Yang,
Jingqi Li,
Guanghua Chen,
Xuebin Jiang
Publication year - 1990
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.39.1965
Subject(s) - diamond , materials science , plasma , raman spectroscopy , chemical vapor deposition , electric arc , analytical chemistry (journal) , hydrogen , carbon film , emission spectrum , spectral line , scanning electron microscope , methane , thin film , optics , optoelectronics , nanotechnology , chemistry , physics , electrode , composite material , organic chemistry , quantum mechanics , chromatography , astronomy
High quality diamond films have been rapidly synthesised by the DC arc discharge plasma CVD in a hydrogen-methane mixture gas. The properties of the films are tested and analyzed by scanning electron microscopy, X-ray diffraction and Raman spectra. In order to find out the growth mechanism of vapor deposited diamond, in situ optical emission spectra of plasma under practical growth conditions are measured. It is found that the key factor of rapid growth diamond film is the presence of a large number of atomic hydrogen in the plasma.