
STUDY OF Ne AUTOIONISING STATES WITH PULSED ELECTRIC FIELD OPTOGALVANIC SPECTROSCOPY
Author(s) -
Lianfang Zhang,
Zhao Wen-Zheng,
Shang Ren-Cheng,
Pan Li,
Shiliang Wang,
Wen Keling,
Dieyan Chen
Publication year - 1990
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.39.1870
Subject(s) - atomic physics , spectroscopy , electric field , stark effect , ionization , materials science , atom (system on chip) , field (mathematics) , physics , ion , mathematics , quantum mechanics , pure mathematics , computer science , embedded system
35 autoionising energy levels of Ne atom in ns(n = l5-35) and nd(n = l3-30) series have been determined experimentally with pulsed electric field optogalvanic spectroscopy. The ionization limit of the ns and nd series was found by parametric fitting and the quantum defects of all these levels were calculated. Instead of the direct discharge, pulsed electric field was used in the experiment, to eliminate Stark effects in the optogalvanic spectroscopy.