Open AccessTHE APPLICATION OF SECOND ORDER DIFFRACTION OF A MONOCHROMETER IN LABORATORY EXAFS MEASUREMENT
Author(s) -
Wencai Wang,
Chong Yang,
Yu Chen
Publication year - 1990
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.39.1684
Subject(s) - extended x ray absorption fine structure , diffraction , distortion (music) , materials science , absorption (acoustics) , impurity , spectral line , range (aeronautics) , absorption spectroscopy , amplitude , surface extended x ray absorption fine structure , optics , physics , computational physics , optoelectronics , quantum mechanics , amplifier , cmos , composite material
Some aspects on the application of second order diffraction of a monochrometer in laboratory EXAFS measurement are studied. Significant distortions in measured X-ray absorption fine structure occur when there are impurities' emission lines on the continuum spectra m the investigated energy range. A method for correcting that distortion is proposed. As the EXAFS amplitude decreases, which is caused by the application of second order diffraction of a monochrometer, how to obtain correct structural parameters is also discussed.