Open AccessCHEMISORPTION OF H2O ON Si(111)7×7 SURFACE AT LOW TEMPERATURES
Author(s) -
朱福荣,
罗艳生,
戴道宣
Publication year - 1989
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.38.296
Subject(s) - chemisorption , x ray photoelectron spectroscopy , materials science , annealing (glass) , water vapor , spectroscopy , molecule , atomic physics , analytical chemistry (journal) , adsorption , chemistry , nuclear magnetic resonance , physics , quantum mechanics , chromatography , organic chemistry , composite material
The chemisorption of water vapor on Si(111)7×7 surface at low temperatures and the effect of annealing were studied, with X-ray photoelectron spectroscopy and energy loss spectroscopy. It was found that the water molecules taken up on the Si(111)7×7 surface were dissociative at 150 K.