Open AccessX-RAY DIFFRACTION INVESTIGATION FOR ANNEALING OF Co-SPUTTERED W-Si FILMS ON S10_2_
Author(s) -
沈建民 徐开文
Publication year - 1989
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.38.1379
Subject(s) - materials science , tungsten , annealing (glass) , sheet resistance , wafer , silicon , diffraction , sputtering , sputter deposition , analytical chemistry (journal) , thin film , optoelectronics , composite material , optics , metallurgy , nanotechnology , chemistry , layer (electronics) , physics , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom