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STUDIES OF FOURIER-TRANSFORM ANALYSIS METHOD FOR ENERGY-DEPENDENT PHOTOELECTRON DIFFRACTION (II)——THE SYSTEMS OF Se-Ni (111) AND S-Ni(111)
Author(s) -
FENG KE-AN,
HUANG YI,
TANG JING-CHANG
Publication year - 1986
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.35.467
Subject(s) - fourier transform , x ray photoelectron spectroscopy , diffraction , energy (signal processing) , atom (system on chip) , materials science , fourier analysis , physics , analytical chemistry (journal) , atomic physics , optics , chemistry , nuclear magnetic resonance , quantum mechanics , chromatography , computer science , embedded system
Direct Fourier-transform analysis method for energy-dependent photoelectron-dif-fraction curves of P(2×2) and (31/2×31/2) Se or S on Ni(lll) system has been studied. From calculations for different adsorption sites and different beams, their influence on Fourier peak positions and related layer spacing modification values △n has been analysed and their relation to atom spacing discussed in some detail.

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