Open AccessGENERAL EQUATION OF FOUR PROBES METHOD FOR RESISTIVITY MEASUREMENT OF SEMICONDUCTOR MATERIALS
Author(s) -
Chen Cun-Li
Publication year - 1985
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.34.1509
Subject(s) - electrical resistivity and conductivity , dimension (graph theory) , semiconductor , point (geometry) , line (geometry) , sheet resistance , contact resistance , materials science , optics , mathematical analysis , physics , computational physics , mathematics , optoelectronics , geometry , nanotechnology , quantum mechanics , layer (electronics) , pure mathematics
The equation of four probes method for resistivity measurement requires point contacts and a definite configuration of probes array. In fact, the contacts are always with definite dimension. In this article, we drive the equations of measuring resistivity and surface sheet resistance, taking into account the contact dimension and putting the location of the four probes arbitrary. The in-line four probes and the square array four probes are two specific examples for the equations.