Open AccessA STUDY OF CONCENTRATION PROFILE OF LOW-MASS IONS IMPLANTED IN METALS BY R. B. S.
Author(s) -
Qu Zhen-yuan,
Ma Tia-Liang,
Gao Naifei,
Hongtao Zhang,
Xiong Jia-Jiong
Publication year - 1984
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.33.1733
Subject(s) - impurity , materials science , ion , substrate (aquarium) , analytical chemistry (journal) , atom (system on chip) , ion implantation , chemistry , oceanography , chromatography , computer science , embedded system , geology , organic chemistry
The concentration profiles of high-dose implanted N+ (5×1017 atom/cm2, 100 keV) in iron foils (about 4000? thick) and iron bulk sample (industrial purity) were measured by E. B. S. via α-particle of energy in order of MeV. A dip was found in backscat-tering spectrum of the substrate, as a result of the high-dose impurity, implantation a method was developed to calculate the concentration profile of impurity based on the dip.