Open AccessBEHAVIOR OF PLASMONS IN GD-a-SixC1-x:H SAMPLES STUDIED BY XPS
Author(s) -
Guanghua Chen,
Fangqing Zhang,
Xu Xixiang
Publication year - 1983
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.32.803
Subject(s) - x ray photoelectron spectroscopy , plasmon , alloy , chemical composition , valence electron , valence (chemistry) , materials science , electron , analytical chemistry (journal) , chemistry , nuclear magnetic resonance , physics , metallurgy , chromatography , optoelectronics , organic chemistry , quantum mechanics
XPS analyses of the GD-a-SixC1-x:H samples have been made, the results are similar to those of katayama. In this paper, the chemical shifts of Si2p and Cls levels, the observed valence-electron plasmon energy hωp and the atomic density of our samples with various alloy composition x are presented. The results are discussed preliminarily.