BEHAVIOR OF PLASMONS IN GD-a-SixC1-x:H SAMPLES STUDIED BY XPS | Zendy

Guanghua Chen | Zendy; Fangqing Zhang | Zendy; Xu Xi-xiang | Zendy

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BEHAVIOR OF PLASMONS IN GD-a-SixC1-x:H SAMPLES STUDIED BY XPS

Author(s) -

Guanghua Chen,

Fangqing Zhang,

Xu Xi-xiang

Publication year - 1983

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.32.803

Subject(s) - x ray photoelectron spectroscopy , plasmon , alloy , chemical composition , valence electron , valence (chemistry) , materials science , electron , analytical chemistry (journal) , chemistry , nuclear magnetic resonance , physics , metallurgy , chromatography , optoelectronics , organic chemistry , quantum mechanics

XPS analyses of the GD-a-SixC1-x:H samples have been made, the results are similar to those of katayama. In this paper, the chemical shifts of Si2p and Cls levels, the observed valence-electron plasmon energy hωp and the atomic density of our samples with various alloy composition x are presented. The results are discussed preliminarily.

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