Open AccessSODIUM DEPOSITION IN FAST ION CONDUCTORS
Author(s) -
Guo Zhu-Kun,
Li Xiangting
Publication year - 1983
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.32.406
Subject(s) - materials science , fast ion conductor , deposition (geology) , ion , crystallite , sodium , electron microprobe , electrolyte , grain boundary , ionic bonding , analytical chemistry (journal) , chemistry , composite material , microstructure , metallurgy , electrode , paleontology , organic chemistry , chromatography , sediment , biology
Sodium deposition in β-, β"-Al2O3 and Nasicon (Na3Zr2Si2PO12) was studied by using EPMA. Based on the mechanism of ion transportation and electrolytic deposition with a diminished carrier concentration, a kinetic equation for sodium deposition has been derived, which can fit well the time dependence of the sodium counts during electron bombardment. Since an abundant source of mobile Na+ ions exists in the large single crystal, the rise of the curve of beta-Al2O3 extends over a long period of time. However, the crystallites in the Nasicon polycrystal are small (+ ion therefore may be provided insufficiently at the electron bombarded point for a prolonged deposition due to the hindrance of the grain boundaries in the ion transport process. The deposition attains its saturation limit rapidly.