Open AccessA NEW TYPE OF PULSED ELECTRON AND ION SOURCE WITH A DURATION OF NANOSECONDS
Author(s) -
Xingliu Jiang,
Ke-fan Chen,
Piao Yu-Bo
Publication year - 1983
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.32.1344
Subject(s) - nanosecond , ion , ampere , electron , materials science , atomic physics , current (fluid) , current density , physics , optics , nuclear physics , laser , quantum mechanics , thermodynamics
This paper describes a new type of electron and ion source under low gas pressure. Pulsed electron beams with a current density greater than 106A/cm2 with total current up to several hundred amperes and pulsed ion beams of the order of amperes were produced by this device. A model of the field escalation effect is proposed to explain the discharge mechanism in the multiplate chamber. It is expected that this device may have a lot of applications .