A NEW TYPE OF PULSED ELECTRON AND ION SOURCE WITH A DURATION OF NANOSECONDS | Zendy

Xingliu Jiang | Zendy; CHEN KE-FAN | Zendy; Y. B. Piao | Zendy

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A NEW TYPE OF PULSED ELECTRON AND ION SOURCE WITH A DURATION OF NANOSECONDS

Author(s) -

Xingliu Jiang,

CHEN KE-FAN,

Y. B. Piao

Publication year - 1983

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.32.1344

Subject(s) - nanosecond , ion , ampere , electron , materials science , atomic physics , current (fluid) , current density , physics , optics , nuclear physics , laser , quantum mechanics , thermodynamics

This paper describes a new type of electron and ion source under low gas pressure. Pulsed electron beams with a current density greater than 106A/cm2 with total current up to several hundred amperes and pulsed ion beams of the order of amperes were produced by this device. A model of the field escalation effect is proposed to explain the discharge mechanism in the multiplate chamber. It is expected that this device may have a lot of applications .

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