Open AccessMONTE CARLO CALCULATION ON THE MEASUREMENT OF THICKNESS OF THIN FILMS IN MICRO-DOMAIN
Author(s) -
He Yan-Cai,
YuChun Huang,
Sun Jing,
Chen Yu-San
Publication year - 1982
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.31.115
Subject(s) - monte carlo method , materials science , thin film , ellipsometry , substrate (aquarium) , intensity (physics) , optics , layer (electronics) , composite material , nanotechnology , physics , statistics , oceanography , geology , mathematics
Monte Carlo method has been used to evaluate the X-ray intensity distribution funetion in freestanding thin films and in surface layer of same thickness of the same material. A simple equation of the X-ray emitting intensity from a thin film on substrate has been proposed to correct the influence of Z. A. P. on the determination of film thickness. The accuracy of the present measurement is higher than that of methods previously. developed. Experimental results are presented for Ta2O5 film on GaAs and for ZrO2 on Si. They are in agreement with those obtained by ellipsometry.