Open AccessDIFFUSION OF PHOSPHORUS INTO SILICON THROUGH SILICON DIOXIDE FILM GROWN BY THERMAL OXIDATION
Author(s) -
CHEN CHEN-CHIA,
YOUNG CHENG-CHING,
HUANG HENG-CHI
Publication year - 1964
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.20.662
Subject(s) - silicon , diffusion , silicon dioxide , materials science , thermal oxidation , phosphorus , thermal , chemical engineering , optoelectronics , thermodynamics , composite material , metallurgy , physics , engineering
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