Open AccessMEASUREMENT OF THE IMPURITY DISTRIBUTION OF DIFFUSED LAYERS IN SILICON BY THE FOUR-POINT PROBE AND THE ANODIC OXIDATION TECHNIQUE
Author(s) -
Ling Shu-Len,
Huang Chaang,
Shu Bieng-Hua
Publication year - 1964
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.20.643
Subject(s) - impurity , silicon , materials science , anodic oxidation , point (geometry) , anode , distribution (mathematics) , analytical chemistry (journal) , chemical physics , optoelectronics , chemistry , electrode , environmental chemistry , organic chemistry , mathematical analysis , geometry , mathematics