Open AccessMEASUREMENT OF THE IMPURITY DISTRIBUTION OF DIFFUSED LAYERS IN SILICON BY THE FOUR-POINT PROBE AND THE ANODIC OXIDATION TECHNIQUE
Author(s) -
LING SHU-LEN,
HUANG CHAANG,
SHU BIENG-HUA
Publication year - 1964
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.20.643
Subject(s) - impurity , silicon , materials science , anodic oxidation , point (geometry) , anode , distribution (mathematics) , analytical chemistry (journal) , chemical physics , optoelectronics , chemistry , electrode , environmental chemistry , organic chemistry , mathematical analysis , geometry , mathematics
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