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Control and automation of an Opposing Magnetron RF Sputtering system to produce nanometric thin films
Author(s) -
Henrique Sendão,
Alexandre Mello
Publication year - 2014
Publication title -
notas técnicas
Language(s) - English
Resource type - Journals
eISSN - 2236-7640
pISSN - 0101-9201
DOI - 10.7437/nt2236-7640/2014.04.001
Subject(s) - automation , sputter deposition , electrical engineering , sputtering , interface (matter) , materials science , engineering , computer science , thin film , mechanical engineering , operating system , nanotechnology , bubble , maximum bubble pressure method

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