Open AccessLithographic mask defects mitigation on a multimode interference structure
Author(s) -
Paulo Lourenço,
Alessandro Fantoni,
João Costa,
M. Vieira
Publication year - 2020
Publication title -
optica pura y aplicada/óptica pura y aplicada
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.147
H-Index - 11
eISSN - 2171-8814
pISSN - 0030-3917
DOI - 10.7149/opa.53.3.51042
Subject(s) - interference (communication) , lithography , interference lithography , materials science , optics , multi mode optical fiber , optoelectronics , computer science , physics , telecommunications , fabrication , medicine , optical fiber , channel (broadcasting) , alternative medicine , pathology