Open AccessStudy on the Properties of TiO2Film Deposited by ALD at Low Temperature
Author(s) -
Won Hee Park,
Jeong Woo Shin,
Byung Chan Yang,
Man-Jin Park,
Dong Young Jang,
Jihwan An
Publication year - 2016
Publication title -
journal of the microelectronics and packaging society
Language(s) - English
Resource type - Journals
eISSN - 2287-7525
pISSN - 1226-9360
DOI - 10.6117/kmeps.2016.23.2.043
Subject(s) - atomic layer deposition , x ray photoelectron spectroscopy , materials science , deposition (geology) , analytical chemistry (journal) , atmospheric temperature range , nanotechnology , thin film , chemical engineering , chemistry , physics , paleontology , chromatography , sediment , meteorology , engineering , biology
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