Open AccessAn approach to accurate x-ray mask measurements in a scanning electron microscope
Author(s) -
Michael T. Postek,
Robert D. Larrabee,
William J. Keery
Publication year - 1989
Language(s) - English
Resource type - Reports
DOI - 10.6028/nist.ir.89-4047
Subject(s) - scanning electron microscope , x ray , electron microscope , environmental scanning electron microscope , optics , microscope , electron , materials science , physics , nuclear physics