z-logo
open-access-imgOpen Access
The dopant density and temperature dependence of electron mobility and resistivity in N-type silicon
Author(s) -
Sheng S. Li
Publication year - 1977
Language(s) - English
Resource type - Reports
DOI - 10.6028/nbs.sp.400-33
Subject(s) - dopant , electrical resistivity and conductivity , electron , silicon , materials science , electron density , electron mobility , condensed matter physics , doping , physics , optoelectronics , nuclear physics , quantum mechanics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom