z-logo
open-access-imgOpen Access
In Situ oxidation of Y?O?-doped Si?N?
Author(s) -
N. J. Tighe,
Koji Kuroda,
T. E. Mitchell,
A. H. Heuer
Publication year - 1980
Language(s) - English
Resource type - Reports
DOI - 10.6028/nbs.ir.80-2075
Subject(s) - in situ , doping , materials science , chemistry , optoelectronics , organic chemistry

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here