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Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films
Author(s) -
S. Mayo,
W. H. Evans
Publication year - 1979
Language(s) - English
Resource type - Reports
DOI - 10.6028/nbs.ir.78-1558
Subject(s) - silicon dioxide , contamination , hydrogen , materials science , silicon , thermal , thin film , chemical engineering , chemistry , nanotechnology , metallurgy , organic chemistry , engineering , physics , thermodynamics , ecology , biology

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