Open AccessResearch and Development of Chemical Mechanical Planarization for Ge2Sb2Te5
Author(s) -
何敖东,
刘波,
宋志棠,
冯高明,
朱南飞,
任佳栋,
吴关平,
冯松林
Publication year - 2013
Publication title -
huaxue xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.565
H-Index - 40
ISSN - 0567-7351
DOI - 10.6023/a13030326
Subject(s) - chemical mechanical planarization , chemistry , metallurgy , organic chemistry , layer (electronics) , materials science