Open AccessNovel Trench Isolation Technology for Suspended MEMS Structures
Author(s) -
Kuo Wen-Cheng
Publication year - 2017
Publication title -
international journal of automation and smart technology
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.148
H-Index - 10
ISSN - 2223-9766
DOI - 10.5875/ausmt.v7i1.1316
Subject(s) - materials science , parylene , microelectromechanical systems , shallow trench isolation , etching (microfabrication) , fabrication , trench , wafer , deep reactive ion etching , optoelectronics , silicon , dry etching , sputtering , reactive ion etching , nanotechnology , polymer , composite material , thin film , layer (electronics) , medicine , alternative medicine , pathology
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