Open AccessThe improvement of Si0.5Ge0.5/Si interface quality by using low energy hydrogen plasma cleaning process and positron annihilation spectroscopy
Author(s) -
Cho-Fan Hsieh,
ChenWei Chen,
Chih-Hua Chen,
M.-H. Liao
Publication year - 2014
Publication title -
international journal of automation and smart technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.148
H-Index - 10
ISSN - 2223-9766
DOI - 10.5875/ausmt.v4i1.234
Subject(s) - photoluminescence , materials science , raman spectroscopy , positron annihilation spectroscopy , spectroscopy , optoelectronics , annihilation , hydrogen , spectral line , analytical chemistry (journal) , positron , electron , optics , positron annihilation , chemistry , physics , organic chemistry , chromatography , quantum mechanics , astronomy
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