Open AccessDesign and tolerance analysis of converging lens in immersion lithography illumination system
Author(s) -
Meixuan Li,
L. Dong
Publication year - 2019
Publication title -
yingyong guangxue
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.229
H-Index - 9
ISSN - 1002-2082
DOI - 10.5768/jao201940.0505003
Subject(s) - immersion lithography , immersion (mathematics) , optics , lens (geology) , materials science , lithography , extreme ultraviolet lithography , computer science , optoelectronics , physics , nanotechnology , resist , mathematics , geometry , layer (electronics)