Open AccessEnhancement of the characteristics of the thin TiSi₂ film for the ULSI devices by preventing the oxidation using the N₂ gas injection
Author(s) -
Tae-Rym Yoon,
Seongjoon Ahn
Publication year - 2022
Publication title -
journal of the korea academia-industrial cooperation society
Language(s) - English
Resource type - Journals
eISSN - 2288-4688
pISSN - 1975-4701
DOI - 10.5762/kais.2022.23.7.542
Subject(s) - materials science , chemical vapor deposition , thin film , composite material , optoelectronics , nanotechnology
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