z-logo
open-access-imgOpen Access
Properties of Indium Tin Oxide Thin Films According to Oxygen Flow Rates by γ-FIB System
Author(s) -
D. H. Kim,
Chang-Hwan Son,
Myoung Soo Yun,
K.A. Lee,
Tae Hoon Jo,
Ilwan Seo,
HyunSeok Uhm,
I. T. Kim,
Eun Ha Choi,
G. S. Cho,
Gi Chung Kwon
Publication year - 2012
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2012.21.6.333
Subject(s) - indium tin oxide , thin film , analytical chemistry (journal) , materials science , scanning electron microscope , auger electron spectroscopy , indium , torr , sputtering , optoelectronics , chemistry , nanotechnology , composite material , physics , chromatography , nuclear physics , thermodynamics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom