Open AccessDischarge Characteristics of Plasma Jet Doping Device with the Atmospheric and Ambient Gas Pressure
Author(s) -
Janggil Kim,
W. Y. Lee,
Y. J. Kim,
Gook Hee Han,
D. J. KIM,
H.C. Kim,
Je Huan Koo,
Gi Chung Kwon,
G. S. Cho
Publication year - 2012
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2012.21.6.301
Subject(s) - plasma , atmospheric pressure , torr , atmospheric pressure plasma , jet (fluid) , wafer , materials science , doping , atomic physics , plasma cleaning , glow discharge , argon , analytical chemistry (journal) , silicon , dense plasma focus , chemistry , optoelectronics , physics , meteorology , mechanics , thermodynamics , quantum mechanics , chromatography
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom