z-logo
open-access-imgOpen Access
Structural, Morphological, and Optical Properties of AlN Thin Films Subjected to Oxygen Flow Ratio
Author(s) -
Shinho Cho,
Moon-Hwan Kim
Publication year - 2010
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2010.19.4.287
Subject(s) - thin film , materials science , oxygen , scanning electron microscope , diffractometer , analytical chemistry (journal) , substrate (aquarium) , sputter deposition , sputtering , band gap , ultraviolet , optoelectronics , nanotechnology , chemistry , composite material , organic chemistry , geology , oceanography , chromatography

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom