Structural, Morphological, and Optical Properties of AlN Thin Films Subjected to Oxygen Flow Ratio
Author(s) -
Shinho Cho,
Moon-Hwan Kim
Publication year - 2010
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2010.19.4.287
Subject(s) - thin film , materials science , oxygen , scanning electron microscope , diffractometer , analytical chemistry (journal) , substrate (aquarium) , sputter deposition , sputtering , band gap , ultraviolet , optoelectronics , nanotechnology , chemistry , composite material , organic chemistry , geology , oceanography , chromatography
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