Open AccessInfluence of Oxygen Flow Ratio on the Properties of In2O3Thin Films Grown by RF Reactive Magnetron Sputtering
Author(s) -
Jun-Ho Kwak,
Shinho Cho
Publication year - 2010
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2010.19.3.224
Subject(s) - sputtering , sputter deposition , materials science , flow (mathematics) , oxygen , thin film , cavity magnetron , optoelectronics , analytical chemistry (journal) , chemistry , nanotechnology , physics , mechanics , environmental chemistry , organic chemistry
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