Open AccessProperties of Al-doped ZnO Transparent Conducting Oxide Films Deposited with Ar Flow Rate by RF Magnetron Sputtering
Author(s) -
Il Hwan Yi,
D.K. Kim,
H.B. Kim
Publication year - 2010
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2010.19.3.206
Subject(s) - materials science , x ray photoelectron spectroscopy , thin film , sputter deposition , doping , sputtering , analytical chemistry (journal) , volumetric flow rate , transmittance , optoelectronics , nanotechnology , chemical engineering , chemistry , physics , chromatography , quantum mechanics , engineering
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