Open AccessEffect by Temperature Distribution of Target Surface during Sputtering by Bipolar Pulsed Dc and Continuous Dc
Author(s) -
WonKyun Yang,
Junghoon Joo,
YoungWoo Kim,
Bong-Ju Lee
Publication year - 2010
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2010.19.1.045
Subject(s) - sputtering , materials science , plasma , high power impulse magnetron sputtering , sputter deposition , ceramic , surface (topology) , thin film , analytical chemistry (journal) , atomic physics , chemistry , composite material , geometry , physics , nanotechnology , mathematics , quantum mechanics , chromatography
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