Open AccessA Global Simulation of SiH4/H2Discharge in a Planar-type Inductively Coupled Plasma Source
Author(s) -
Won-Gi Lee,
Deuk-Chul Kwon,
N. S. Yoon
Publication year - 2009
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2009.18.6.426
Subject(s) - inductively coupled plasma , ion , plasma , planar , chemistry , electron , atomic physics , plasma parameters , electron temperature , analytical chemistry (journal) , physics , computer graphics (images) , organic chemistry , chromatography , quantum mechanics , computer science
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