Open AccessDevelopment of High Density Inductively Coupled Plasma Sources for SiH4/O2/Ar Discharge
Author(s) -
Sun Hyoung Bae,
Deuk-Chul Kwon,
N. S. Yoon
Publication year - 2008
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2008.17.5.426
Subject(s) - plasma , atomic physics , ion , chemistry , inductively coupled plasma , radical , analytical chemistry (journal) , electron density , electron temperature , electron , plasma parameters , argon , physics , organic chemistry , chromatography , quantum mechanics
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