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La0.7Sr0.3MnO3CMR thin film resistor deposited on SiO2/Si and Si substrates by rf magnetron sputtering for infrared sensor
Author(s) -
Sun Gyu Choi,
A. Sivasankar Reddy,
Byoung–Gon Yu,
Hojun Ryu,
Hyung Ho Park
Publication year - 2008
Publication title -
applied science and convergence technology/han'gug jin'gong hag'hoeji
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2008.17.2.130
Subject(s) - materials science , thin film , sputter deposition , sputtering , annealing (glass) , grain size , sheet resistance , analytical chemistry (journal) , crystallite , oxygen , cavity magnetron , volumetric flow rate , temperature coefficient , metallurgy , composite material , nanotechnology , chemistry , layer (electronics) , chromatography , physics , organic chemistry , quantum mechanics

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