Open AccessThe study about accelerating Photoresist strip under plasma
Author(s) -
Soo-In Kim,
ChangWoo Lee
Publication year - 2008
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2008.17.2.113
Subject(s) - photoresist , etching (microfabrication) , dry etching , plasma etching , materials science , plasma , semiconductor , optoelectronics , dilution , reactive ion etching , semiconductor device fabrication , nanotechnology , layer (electronics) , wafer , physics , thermodynamics , quantum mechanics
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