Open AccessMethod to control the Sizes of the Nanopatterns Using Block Copolymer
Author(s) -
Gil-Bum Kang,
SeongIl Kim,
I. K. Han
Publication year - 2007
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/jkvs.2007.16.5.366
Subject(s) - materials science , methyl methacrylate , polystyrene , etching (microfabrication) , copolymer , layer (electronics) , reactive ion etching , substrate (aquarium) , silicon , resist , silicon oxide , nanotechnology , polymethyl methacrylate , optoelectronics , composite material , polymer , oceanography , silicon nitride , geology
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